Polishing Pads / Polishing Cloths
Polishing pads enable flat polished surfaces to be produced on many softer materials. Kemet offer a wide range of self-adhesive and metallic backed polishing pads.
Kemet Chemo-textile Pads
These are manufactured to the highest standards with accurately controlled uniform thickness. Self-adhesive, and available in medium (PSU-M) and hard (PAD-K) formats. Chem Cloth is also available for Chemo-mechanical Polishing.
Pack of 10 | Diameter (mm) | ||||||
---|---|---|---|---|---|---|---|
Type | 75 | 150 | 200 | 250 | 300 | 380 | |
PSU-M | 341021 | 341007 | 341008 | 341009 | 341010 | 341011 | |
PAD-K | 341037 | 341020 | 341017 | 341028 | 341039 | 341024 |
PSU-M
A firm, dense and uniform, non-woven polishing cloth for use as an intermediary pad, after grinding and before final polishing. The perfect pad for finishing plastics with non-diamond abrasives. Use with AcryPol for final polishing of Acrylic lenses.
PAD-K
The ultra-hard chemo-textile pad used where fast cutting is needed.
Kemet Silk-Type Pads
Kemet silk-type pads have been developed for finishing metal specimens and components.
Pack of 10 | Diameter (mm) | ||||
---|---|---|---|---|---|
Type | 150 | 200 | 250 | 300 | 380 |
ASFL | 341147 | 341148 | 341162 | 341111 | 341112 |
MSFL | 341751 | 341752 | 341754 | 341755 | 341756 |
MSR | 341701 | 341702 | 341707 | 341704 | 341705 |
MST | 341761 | 341762 | 341764 | 341763 | 341765 |
ASR | - | 341120 | 341119 | 341103 | 341129 |
AST | 341300 | 341297 | 341279 | - |
ASFL
Woven synthetic silk polishing cloth with internal barrier for mirror polishing of metals and plastics. Use with 3 μm (and finer) Kemet Diamond Suspensions. Thin polishing surface means minimal edge roll-off. Suitable for the preparation of metallurgical specimens. Achieves excellent flatness and surface finish.
MSFL
Will polish metal flat, and to a mirror finish. Best results are obtained when used with Kemet Diamond Compound or Diamond Suspension 3 micron and finer. Water resistant adhesive (oil resistant available).
MSR
Similar to MSFL with rigid plastic backing. It has good chemical resistance and produces excellent flatness and a mirror finish on most metals. The cloth face is synthetic silk mounted onto a fluid resistant barrier.
MST
An extra hard, rigid silk cloth for increased cutting action.
ASR
Similar to ASFL with the addition of a rigid and thick barrier foil for heavy parts where roll off is not such a concern.
AST
Used for increased cutting action and good general flatness control. Use with 15 - 6 micron diamond before final polishing.
Kemet Nap-Type Pads
For final polishing stages of preparation, Kemet Nap Type Pads are available with a range of softness and nap length. They give a more gentle polish, and are ideal for softer specimens and components. All pads are self-adhesive unless marked ‘plain'.
Pack of 10 | Diameter (mm) | ||||
---|---|---|---|---|---|
Type | 150 | 200 | 250 | 300 | 380 |
MBL | 341721 | 341722 | 341726 | 341724 | 341725 |
MRE | 341711 | 341712 | 341716 | 341714 | 341715 |
NSH-B | 341256 | 341257 | 341246 | 341203 | 341243 |
NLH | 341241 | 341205 | 341247 | 341206 | 341248 |
Chem H | 341779 | 341782 | 341783 | 341784 | 341865 |
LIL-Plus | 341613 | 341611 | 341610 | 341609 | - |
Kan | 341075 | 341076 | 341077 | 341070 | - |
Roll Material
Type | Unit | Code |
---|---|---|
MRE | 50" wide x 1yd | 341236 |
Selvyt SR | 1400mm wide x 1m | 341305 |
MBL
Synthetic flock sprayed onto cotton carrier. Use with 3 μm (and finer) Aquapol Diamond Suspension after pre-polishing.
MRE
Synthetic flock on a flexible waterproof carrier. A heavy duty flock cloth for use with 6 μm Aquapol Diamond Suspension and finer. Also the perfect cloth for CMP superfinishing on soft materials with Kemet Col-K NC.
NSH-B
A short nap cloth with woven backing ideal for final polishing with 3 μm (and finer) Aquapol Diamond Suspension.
NLH
Very soft, flocked polishing cloth made of absorbent viscose fibres on a woven cotton substrate. Perfect final polishing cloth for harder alloys using Aquapol-P Diamond Suspension or Kemet CP polycrystalline Diamond Compounds.
Chem H
Buffed polyurethane with microscopic voids, laminated to a non-woven substrate. A more closed pore structure which gives a longer life time and higher stock removal. The very fine fibres are mainly horizontally oriented and they make the pad more dense. Ideal polishing pad for use with colloidal silica chemical mechanical polishing.
LIL-Plus
Soft, flocked polishing cloth made of absorbent viscose fibres on a polymer backing. Use with 3 μm (and finer) Aquapol Diamond Suspension.
Selvyt SR
A cotton pad of medium nap with a single pile. Available only as non-adhesive.
Kan
Woven polishing cloth made from 100% pure wool for final polishing using Kemet Diamond or conventional abrasives.
Metallographic Disc Storage Unit
Storage unit for protecting polishing pads, discs and cutting wheels with a diameter of up to 300mm
Dimensions - 320 x 251 x 332 mm (WxHxD)
Number of draws - 9
Product code - 363211