Col-K Polishing Suspension (CMP Slurry)

Colloidal silica suspension is able to produce the ultimate in high quality mirror polishes on polishing machine. A part abrasive, part chemical polishing action makes colloidal silica well suited to polishing difficult materials such as Stellite and Cobalt Chrome.

One of the disadvantages of colloidal silica is that it can crystallise out of solution. The crystals have a corrosive action and can attack material.

Kemet has developed the next generation of colloidal silica – a non crystallising version called Kemet Col-K (NC). This is available in 1, 5 and 20 litre containers.

Effect of using colloidal silica

Effect of using colloidal silica on a lapping machine. Notice the white residue (crystals) on the machine.

Effect of using Kemet Col-K

Effect of using Kemet Col-K (NC) on a Kemet 15 Lapping machine. Notice that there is no white residue on the machine.

Col-K Polishing Slurry

A Liquid polish used on Kemet CHEM Cloth to produce the ultimate in high quality mirror polishes on cmp polishing machines. A part abrasive, part chemical polishing action makes COL-K well suited to polishing difficult materials such as Stellite and Cobalt Chrome.

col-k cmp slurry

Description Unit Code
Col-K (NC), 0.06 μm 1 Litre 600261
Col-K (NC), 0.06 μm 5 Litres 600199
Col-K (NC), 0.06 μm 20 Litres 600202
Col-K, 0.06 μm 1 Litre 600262
Col-K, 0.06 μm 5 Litres 600212
Col-K, 0.06 μm 20 Litres 600204

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